Carrier head design for a chemical mechanical polishing apparatu

Details Carrier head design for a chemical mechanical polishing apparatu Carrier head design for a chemical mechanical polishing apparatu

1996-04-24

1998-06-09

Smith, James G.

Abrading

Machine

Rotary tool

451289, B24B 500, B24B 2900

Patent

active

057625441

ABSTRACT:
A carrier head uses a pressure chamber and a gimbal. The gimbal allows the carrier base to pivot with respect to the drive shaft about a point at the interface between the substrate and the polishing pad. The gimbal may "float" so that no downward force is applied to the substrate through the gimbal. A rolling diaphragm seals the carrier base to the carrier housing to form a chamber. By pressurizing the chamber, an even load can be applied across the substrate. A retaining ring is independently loaded by an inflatable bladder. Torque is transferred from the carrier housing to the carrier base by horizontal pins positioned near the substrate. The pins can slide vertically in the housing, but not laterally. However, there is sufficiently elasticity to allow the torque pins to comply with manufacturing tolerances so that both torque pins bear the rotational load.

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