Capped dual metal gate transistors for CMOS process and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S412000, C438S275000, C438S283000

Reexamination Certificate

active

06894353

ABSTRACT:
A first gate (120) and a second gate (122) are preferably PMOS and NMOS transistors, respectively, formed in an n-type well (104) and a p-type well (106). In a preferred embodiment first gate (120) includes a first metal layer (110) of titanium nitride on a gate dielectric (108), a second metal layer (114) of tantalum silicon nitride and a silicon containing layer (116) of polysilicon. Second gate (122) includes second metal layer (114) of a tantalum silicon nitride layer on the gate dielectric (108) and a silicon containing layer (116) of polysilicon. First spacers (124) are formed adjacent the sidewalls of the gates to protect the metals from chemistries used to remove photoresist masks during implant steps. Since the chemistries used are selective to polysilicon, the spacers (124) need not protect the polysilicon capping layers, thereby increasing the process margin of the spacer etch process. The polysilicon cap also facilitates silicidation of the gates.

REFERENCES:
patent: 4593454 (1986-06-01), Baudrant et al.
patent: 4605947 (1986-08-01), Price et al.
patent: 5960270 (1999-09-01), Misra et al.
patent: 6033963 (2000-03-01), Huang et al.
patent: 6049114 (2000-04-01), Maiti et al.
patent: 6084279 (2000-07-01), Nguyen et al.
patent: 6190981 (2001-02-01), Lin et al.
patent: 6346734 (2002-02-01), Divakaruni et al.
patent: 6444512 (2002-09-01), Madhukar et al.
patent: 6518106 (2003-02-01), Ngai et al.
patent: 6545324 (2003-04-01), Madhukar et al.
patent: 6562676 (2003-05-01), Ju
patent: 6563178 (2003-05-01), Moriwaki et al.
patent: 6607950 (2003-08-01), Henson et al.
patent: 6794281 (2004-09-01), Madhukar et al.
patent: 60045053 (1985-03-01), None
Halas et al., Work functions of elements expressed in terms of the Fermi energy and the density of free electrons,J. Phys.: Condes. Matter, 10 (Dec. 1998) 10815.*
Cheng et al., Metal gates for advanced sub-80-nm SOI CMOS technology,2001 IEEE Inter. SOI Conf., (Oct. 2001) 91.*
Lu et al.; “Dual-Metal Gate Technology For Deep Submicron CMOS Transistors;” IEEE, Symposium on VLSI Technology Digest of Technical Paper; pp. 72-73 (2000).
Maiti et al., “Metal Gates for Advanced CMOS Technology,” SPIE Conference on Microelectronic Device Technology III, SPIE vol. 3881, pp. 46-57 (1999).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Capped dual metal gate transistors for CMOS process and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capped dual metal gate transistors for CMOS process and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capped dual metal gate transistors for CMOS process and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3381376

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.