Capacitor with via plugs forming first and second electrodes...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S295000, C257S296000, C257S303000, C257S306000

Reexamination Certificate

active

06864526

ABSTRACT:
A capacitor which can be manufactured easily without an addition of photo masks and manufacturing processes is obtained.The capacitor has a plural via plugs (1ato1c) which function as a first electrode and a plural via plugs (2ato2c) which function as a second electrode. The via plugs (1ato1c) are formed in a row along an X direction, and similarly, the via plugs (2ato2c) are also formed in a row along the X direction. The capacitor is formed in a multilayer wiring structure of a semiconductor device, and the via plugs (1ato1c) and the via plugs (2ato2c) face each other with part of an interlayer insulating film between. Part of the interlayer insulating film which is put between the via plugs (1ato1c) and the via plugs (2ato2c) function as a capacitor dielectric film.

REFERENCES:
patent: 6313003 (2001-11-01), Chen
patent: 6492226 (2002-12-01), Hsue et al.
patent: 20020163029 (2002-11-01), Dirnecker et al.
patent: 20030027385 (2003-02-01), Park et al.
patent: 20030075747 (2003-04-01), Kim
patent: 2000-228497 (2000-08-01), None
patent: 2001-167974 (2001-06-01), None
patent: 2001-237375 (2001-08-01), None

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