Capacitor for a semiconductor device

Details Capacitor for a semiconductor device Capacitor for a semiconductor device

2006-11-06

2009-06-30

McPherson, John A (Department: 1795)

Electricity: electrical systems and devices

Electrostatic capacitors

Fixed capacitor

C361S303000, C361S301100

Reexamination Certificate

active

07554788

ABSTRACT:
In a method for forming a photoresist pattern, a method for forming a capacitor, and a capacitor manufactured using the same, a light is selectively irradiated onto a selected portion of a photoresist film formed on a substrate. An interfered light generated from the irradiated light is transmitted through other portions of the photoresist film except a ring-shaped portion of the photoresist film having a predetermined width along a boundary of the selected portion. The photoresist film is exposed using the interfered light and the light irradiated onto the selected portion. A cylindrical photoresist pattern having a minute width may be formed through developing the photoresist film. With the cylindrical pattern, the capacitor can be easily formed.

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patent: 2004/0111693 (2004-06-01), Lin et al.
patent: 2001 0092874 (2001-10-01), None

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