Capacitor containing high purity tantalum

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Beam leads

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S766000, C257S775000

Reexamination Certificate

active

07102229

ABSTRACT:
Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.

REFERENCES:
patent: 5700519 (1997-12-01), Lam
patent: 252442 (1960-08-01), None
patent: 19841774 (1999-03-01), None
patent: 0902102 (1991-03-01), None
patent: 55-179784 (1980-12-01), None
patent: 362259448 (1987-11-01), None
patent: 62-297463 (1987-12-01), None
patent: 03-197640 (1991-08-01), None
patent: 403197640 (1991-08-01), None
patent: 200212678 (2000-08-01), None
patent: WO96/20892 (1996-07-01), None
patent: WO200031310 (2000-06-01), None
patent: WO 00/31310 (2000-07-01), None
Tittering, et a., “The Production and Fabrication of Tantalum Powder,” Symposium on Powder Metallurgy, 1954, pp. 11-18.
Michaluk et al., “Factors Affecting the Mechanical Properties and Texture of Tantalum,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 205-207.
Tripp et al., “The Production of Tantalum by the Sodium Reduction Process,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 23-27.
Fukang, et al., “Tantalum Industry in China,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 287-292.
Eckert, “The Industrial Application of Pyrometallurgical, Chlorination and Hydrometallurty for Producing Tantalum Compounds,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thAnnual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 55-61.
Suri et al., “Studies on Tantalum Extraction,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thAnnual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 39-46.
Albrecht, et al., “Modern Extraction of Tantalum and Niobium with Special Emphasis on the Production of High Purity Compounds,” Conference Proceedings of Inter. Symposium On Tantalum and Niobium, Nov. 1988, Brussels, Belgium, 22 pages.
Alchert et al., “Progresses in the Economical Production of Very Clean Refractory Metals and Alloys by Electron Beam Melting,” Conference Proceedings on Progress in the Economical Production of Very Clean Refractory Metals and Alloys, May 1985, Reutte, Austria, pp. 863-877.
Pierret et al., “Operation of Electron Beam Furnace for Melting Refractory Metals,” pp. 208-217, Conference and date unknown.
Nair, et al., “Production of Tantalum Metal by the Aluminothermic Reduction of Tantalum Pentoxide,” Journal of the Less-Common Metals 41 (1974) pp. 87-95, The Netherlands.
Klopp, et al., “Purification Reactions of Tantalum During Vacuum Sintering,” Transactions of the Metallurgical Society of AIME, vol. 218, Dec. 1960, pp. 971-977.
Rolsten, “Iodide Metals and Metal Iodides,” John Wiley & Sons, Inc., New York-London, 1961, pp. 8-17 and 110-119.
Jain et al., “Pilot Plant Production of Capacitor Grade Tantalum Powder,” Transactions of the Indian Institute of Metals, Dec. 1971, pp. 1-8.
Crockett, et al. “Niobium (Columbium) and Tantalum,” International Strategic Minerals Inventory Summary Report, pp. 1-21 and 34-37.
Kononov, et al., “Electrorefining in Molten Salts—An Effective Method of High Purity Tantalum, Hafnium As Scandlum Metal Production,” Journal of Alloys and Compounds 218 (1995), pp. 173-176.
Bose, et al., “Preparation of Capacitor Grade Tantalum Powder,” Transactions of the Indian Institute Of Metals, Jun. 1970, pp. 1-5.
Korinek, “Tantalum—An Overview,” Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, pp. 3-15.
Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, p. 240.
Symposium jointly sponsored by SCAMP and SMD (RMMC), 125thTMS Annual Meeting and Exhibition, Anaheim, CA Feb. 1996, p. 274.
Cabot Performance Materials, Material Evaluation Report, Feb. 2, 1999, Ingot No. T0961.
Cabot Performance Materials, Material Evaluation Report, March 25, 1998. Ingot No. T843A.
R.H. Burns, et al., “Evolution of applications of tantalum,” in proceedings “Tantalum,” edited by E. Chen, et al., published by TMS, 1996, pp. 273-285.
G. Jun, et al., “Low temperature deposition of TaCN films using pentakis (diethylamido) tantalum,” In MRS symposium proceedings, vol. 427: Advanced Metallization for Future ULSI, edited by K.N. Tu, et al., published by MRS, 1996, pp. 349-354.
J.O. Olowalafe et al., “The effect of Ta to Si ratio on magnetron sputtered Ta-Si-N thin films,” J. Electronic Materials, vol. 28, No. 12, 1999, pp. 1399-1402.
F. Lantalme, et al., “Electrodeposition of tantalum in NaCI-KCI-K2TaF7 melts”, J. Electrochm. Soc., vol. 139, No. 5, pp. 1249-1255.
G. Li, et al., “Electrochemical reduction of tantalum in molten NaCI-KCI-K2TaF7”, Transaction s of Nfsoc., vol. 2, No. 3, 1992, pp. 64-68.
A. Girginov, et al., “Electordeposition of refractory metals (Ti, Zr, Nb, Ta) from molten salt electrolytes”, J. Applied Electrochemistry, 25, 1995, pp. 993-1003.
M. Bachter, et al., “Electrochemical and simultaneous spectroscopic study of reduction mechanism and Electronic conduction during electrodeposition of tantalum in molten alkali chlorides”, Ber. Bunsenges. Phys. Chem. 99, No. 1, 1995, pp. 21-31.
L.P. Polyakova, et al., “Secondary processes during tantalum electrodeposition in molten salts”, J. Applied Electrochemistry 22, 1992, pp. 628-637.
C.K. Gupta, “Extractive metallurgy of niobium, tantalum and vanadium”, International Metals Review, vol. 29, No. 6, 1984, pp. 405-444.
World Wide Website: http://www.electrometals.com.au/EMEWTechProfile.html. Electrometal Technologies Limited, EMEW Electrowinning Technology Profile, 1999.
World Wide Website: http://www.pwbrc.org/bmr/ew.htm. “Electrowinning”, Sep. 6, 2000.
Trinitech International Inc., Material Evaluation Report, Apr. 13, 1994, Lot No. 6-15-2.
Hughes et al., “Grain Subdivision and the Development of Local Orientations in Rolled Tantalum” Tantalum, The Minerals, Metals & Materials Society, 1996, pp. 257-262 (Year is sufficiently early so that the month is not an issue.).
Arlt, Jr., “Sulfonation and Sulfonation to Thorium and Thorium Compounds”, Kirk-Othmer Encyclopedia of Chemical Technology, vol. 22, pp. 541-564 (1993).
Kirbride, et al., “The Effect of Yitrium on the Recrystallization of Grain Growth of Tantalum”, J. Less-Common Metals. vol. 9, pp. 393-408, 1965.
National Research Corporation Press Release, pp. 1-4, Jul. 1964.
National Research Corporation Data Sheet “SGS Tantalum”, pp. 1-7, no date.
Derwent Abstract of WO20031310-A1. Huber et al., Jun. 2, 2000, Derwent Acc-No. 2000-441864.
ASTM Standard Specification for Tantalum and Tantalum Alloy Plate, Sheet, and Strip, pp. 558-561, 1992.
Kumar, et al., “Effect of Intermetallic Compounds of the Properties of Tantalum” Materials Research Society Symposium Proceedings, vol. 322, pp. 413-422, 1994.
Kumar, et al., “Effect of Intermetallic Compounds of the Properties of Tantalum” Refractory Metals & Hard Matrials, vol. 12, pp. 35-40, 1994.
Klein, et al., “Inhomogeneous Texture in Tantalum Sheets”, Materials Science Forum, vol. 157-162, p. 1423, 1994.
Clark, et al., “Influence of Transverse Rolling on the Microstructural and Texture Development in Pure Tantalum”, Metallurgical Transactions, vol. 23A, pp. 2183-2191, Aug. 1992.
Raabe, et al., “Texture Microstructure of Rolled and Annealed Tantalum”, Materials Science and Technology, vol. 10, pp. 299-305, Apr. 199

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Capacitor containing high purity tantalum does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capacitor containing high purity tantalum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capacitor containing high purity tantalum will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3612250

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.