Capacitively coupled radiofrequency plasma source

Details Capacitively coupled radiofrequency plasma source Capacitively coupled radiofrequency plasma source

1992-07-29

1993-12-28

Mottola, Steven

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31511131, 31323131, H05H 146

Patent

active

052743063

ABSTRACT:
A pair of dissimilarly-sized electrodes are driven by a radiofrequency source to create a plasma. A magnetic field is oriented to be parallel to a surface area on the smaller electrode. The field strength increases to either side of that smaller electrode. As shown, ions are electrostatically accelerated out of the plasma, but they instead may be accelerated magnetically, electrons may in the alternative be extracted or there may be no accelerating mechanism.

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