Capacitive surface micromachine absolute pressure sensor and met

Details Capacitive surface micromachine absolute pressure sensor and met Capacitive surface micromachine absolute pressure sensor and met

1993-02-05

1994-05-31

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156650, 156657, 1566591, 156662, 437233, 437919, 73715, H01L 21306, B44C 122

Patent

active

053166191

ABSTRACT:
A polysilicon diaphragm is formed on top of a sacrificial layer deposited upon a semiconductor substrate, where the thickness of the layer is controllable. The sacrificial layer is removed to define a diaphragm cavity, which is sealed with a plug. Electrodes within the surfaces defining the cavity deflect in response to variations in pressure, while providing a very small and minimum parasitic capacitance.

REFERENCES:
patent: 3539705 (1970-11-01), Nathanson et al.
patent: 3846166 (1972-09-01), Saiki et al.
patent: 4665610 (1987-05-01), Barth
patent: 4740410 (1988-04-01), Muller et al.
patent: 4744863 (1988-05-01), Guckel et al.
patent: 4808549 (1989-02-01), Mikkor et al.
patent: 4849070 (1989-07-01), Bly et al.
patent: 4861420 (1989-08-01), Knutti et al.
patent: 4895616 (1990-01-01), Higashi et al.
patent: 4975390 (1990-12-01), Fujii et al.
Article entitled "An Thin Film Capacitive Pressur Sensor", by Yoshiyuki Ishikura et al.; Technical Digest of the 11th Sensor Symposium, 1992, pp. 149-152.
Article entitled "Capactive Silicon Pressure Sensor Based on the One-Side Wafer Processing", by J. M. Lysko et al.; 1991 IEEE, pp. 685-688.
Arthur Adamson, "Physical Chemistry of Surfaces", 5th Edition, pp. 385-387.
Williams et al, "Wetting of thin layers of SiO.sub.2 by water", Applied Physics Letters, vol. 25, No. 10, Nov. 1974.
Scheeper et al, "Surface Forces in Micromachined Structures", Micromechanics Europe 1990, pp. 26-27.
Guckel et al, "Fabrication of Micromechanical Devices from Polysilicon Films with Smooth Surfaces", Sensors and Actuators, 20(1989), pp. 117-122.
Oppana et al, "Control of Residual Stress of Polysilicon Thin Films by Heavy Doping in Surface Micromachining", Transducers 1991, pp. 957-960.
Takeshima et al, "Electrostatic Parallelogram Actuators", Transducers 1991, pp. 63-66 1991.
"Surface and colloid Science", vol. 2, 1969, pp. 25-153.
Ishikura et al, "A Thin Film Capacitive Pressure Sensor", Techanical Digest of the 11th Sensor Symposium, 1992, pp. 149-152.

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