Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1987-01-09
1991-04-09
Razavi, Michael
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511131, 31511171, 31511191, H05B 3126
Patent
active
050067605
ABSTRACT:
A capacitive feed is disclosed for the lower electrode in a parallel plate plasma reactor. One plate of the capacitor comprises the lower electrode or a contact to the lower electrode. The other plate of the capacitor comprises an annular member insulated from the lower electrode, or the contact. There are no RF connections directly to the lower electrode.
REFERENCES:
patent: 3489933 (1970-01-01), Meyerand
patent: 4209357 (1980-06-01), Gorin et al.
Motorola Inc.
Razavi Michael
Wille Paul F.
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