Capacitive coupling plasma processing apparatus and method...

Details Capacitive coupling plasma processing apparatus and method... Capacitive coupling plasma processing apparatus and method...

2011-08-09

2011-08-09

Gramaglia, Maureen (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER, C315S111210

Reexamination Certificate

active

07993489

ABSTRACT:
A plasma processing apparatus includes a process container configured to accommodate a target substrate and to be vacuum-exhausted. A first electrode and a second electrode are disposed opposite each other within the process container. The first electrode includes an outer portion and an inner portion both facing the second electrode such that the outer portion surrounds the inner portion. An RF power supply is configured to apply an RF power to the outer portion of the first electrode. A DC power supply is configured to apply a DC voltage to the inner portion of the first electrode. A process gas supply unit is configured to supply a process gas into the process container, wherein plasma of the process gas is generated between the first electrode and the second electrode.

REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 5298103 (1994-03-01), Steinberg et al.
patent: 6239403 (2001-05-01), Dible et al.
patent: 6620335 (2003-09-01), DeOrnellas et al.
patent: 2004/0000875 (2004-01-01), Vahedi et al.
patent: 2004/0035365 (2004-02-01), Yamazawa et al.
patent: 2004/0177927 (2004-09-01), Kikuchi et al.
patent: 2000-173993 (2000-06-01), None
patent: 2000-323456 (2000-11-01), None
patent: 2001-250815 (2001-09-01), None
patent: 2004-193566 (2004-07-01), None

Affiliated with

Also associated with

Rating

Capacitive coupling plasma processing apparatus and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capacitive coupling plasma processing apparatus and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capacitive coupling plasma processing apparatus and method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2742451