Capacitatively coupled plasma device

Details Capacitatively coupled plasma device Capacitatively coupled plasma device

1981-12-03

1984-10-23

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

219121PM, 313607, 31511111, H01J 724, H05B 3126

Patent

active

044790759

ABSTRACT:
A capacitatively coupled plasma device has a plasma tube, an electrode positioned near the tube and means to supply a high voltage, high frequency potential such as a radio frequency to the tube to energize a flow of argon or like gas to form a plasma. A sample of material is excited by the plasma energy to emit characteristic radiation for analysis by suitable means such as spectrometric analysis or for other use and application.

REFERENCES:
patent: 3596128 (1971-07-01), Elliott
patent: 4009413 (1977-02-01), Elliott et al.
patent: 4147957 (1979-04-01), Hildebrand
K. A. Egorova; Use of a High Frequency Electrodeless Discharge in the Analysis of Solutions; Zhurnal Prikladnoi Spectroskopii, vol. 6, No. 1, pp. 22-26; 1967.
A. V. Zvyagintsev et al.; Electrodeless Capacitative Arc; Sov. Phys. Tech. Phys.; vol. 20, No. 2.
N. I. Gondar et al.; Electrodeless Plasma Generator with Capacitative Arc Discharge; Sov. Phys. Tech. Phys.; vol. 20, No. 3; pp. 407-408.

Affiliated with

Also associated with

Rating

Capacitatively coupled plasma device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capacitatively coupled plasma device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capacitatively coupled plasma device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1601178