Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-01-18
2011-01-18
Warren, Matthew E (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S310000, C257S637000, C257S640000, C257SE29343
Reexamination Certificate
active
07872292
ABSTRACT:
A capacitance dielectric layer is provided. The capacitance dielectric layer includes a first dielectric layer, a second dielectric layer and a silicon nitride stacked layer. The silicon nitride stacked layer is disposed between the first dielectric layer and the second dielectric layer. The structure of the capacitance dielectric layer permits an increase in the capacitance per unit area by decreasing the thickness of the capacitance dielectric layer and eliminates the problems of having a raised leakage current and a diminished breakdown voltage.
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patent: 6200852 (2001-03-01), Lou et al.
patent: 6680500 (2004-01-01), Low et al.
patent: 2004/0141390 (2004-07-01), Won et al.
patent: 418529 (2001-01-01), None
Chen Hsin-Hsing
Chiang Yu-Ho
Wang Chih-Chun
J.C. Patents
United Microelectronics Corp.
Warren Matthew E
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