Calixarenes for use as dissolution inhibitors in lithographic ph

Details Calixarenes for use as dissolution inhibitors in lithographic ph Calixarenes for use as dissolution inhibitors in lithographic ph

1998-07-31

2000-07-25

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

568633, 568632, 568640, 568719, 562466, G03F 7039, C07C 4100

Patent

active

060935170

ABSTRACT:
A lithographic photoresist composition is provided containing novel calixarene compounds, particularly calix[4]resorcinarenes that are partially or wholly protected with acid-labile functionalities, as dissolution inhibitors. Also provided is a process for using the composition to generate resist images on a substrate is provided, i.e., in the manufacture of integrated circuits or the like.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5580694 (1996-12-01), Allen et al.
patent: 5625020 (1997-04-01), Breyta et al.
patent: 5688998 (1997-11-01), Ichimura et al.
Sakamizu, T. et al, J.Photopoly.Sci.Technol., 11(4), 1998, 547-552.
Hayashi, Y., J.Chem.Soc.Perkin Trans.2, 2(4), Apr. 1998, 981-987.
Abis, L. et al, J.Org.Chem., 53, 1988, 5475-5479.
Botta, B. et al, J.Org.Chem., 59, 1994, 1532-1541.
Chemical Abstracts 117:234117 of Mendeleev Commun., 3, 1992, 106-8. pp. 14-16 provided of Chemical Abstracts computer printout of the abstract.
Allen et al. (1995), "Resolution and Etch Resistance of a Family of 193 nm Positive Resists," J. Photopolm. Sci. and Tech. 8(4):623-636.
Arduini et al. (1984), ".rho.-t-Butyl-Calix[4]arene Tetracarboxylic Acid. A Water Soluble Calixarene in a Cone Structure," J. Chem. Soc., Chem. Commun.:981-982.
Fujita et al. (1996), "Ultrahigh Resolution of Calixarene Negative Resist in Electron Beam Lithography," Appl. Phys. Lett. 68(9):1297-1299.
Gutsche (1983), "Calixarenes," Acc. Chem. Res. 16:161-170.
Ito et al. (1994), "Environmentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance, and Lithographic Feasibility," J. Photopolym. Sci. and Tech. 7(3):433-448.
Nakayama et al. (1997), "A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resourcinarene, a Cross-linker, and a Photoacid Generator," Chem. Lett.:265-266.
Ohnishi et al. (1997), "Calixarene Resists for Nano-Lithography," Proc. ACS Div. Polym. Mater. Sci. Eng. 77:453-454.
Ueda et al. (1997), "A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resocinarenes, a Cross-linker, and a Photoacid Generator," Proc. ACS Div. Polym. Mater. Sci. Eng. 77:455-456.

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