Calculation system for inverse masks

Details Calculation system for inverse masks Calculation system for inverse masks

2006-02-28

2009-02-03

Garbowski, Leigh Marie (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07487489

ABSTRACT:
A system for calculating mask data to create a desired layout pattern on a wafer reads all or a portion of a desired layout pattern. Mask data having pixels with transmission characteristics is defined along with corresponding optimal mask data pixel transmission characteristics. An objective function is defined having one or more penalty functions that promote solutions representing a desired resolution enhancement technique. Optimization of the objective function determines the transmission characteristics of the pixels in the mask data that is used to create one or more corresponding masks or reticles.

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