1982-12-20
1991-01-01
Hille, Rolf
357 71, 357 67, H01L 2954, H01L 2956
Patent
active
049822446
ABSTRACT:
A buried Schottky clamped transistor is described in which the Schottky diode comprises a region of metal silicide 24 in the epitaxial layer 15 adjacent the transistor. The structure includes an electrically isolated region of N type epitaxial silicon 15 having an upper surface, a region of metal silicide 24 formed in the epitaxial silicon 15 adjacent the upper surface, an emitter region 33 of first conductivity type also formed in the epitaxial silicon adjacent the upper surface, base region 29 of opposite conductivity type adjacent the upper surface which separates the emitter 33 from the metal silicide 24, and metal connections 37, 38 and 39 for making electrical connections to each of the regions of metal silicide 24, the emitter region 33, and the epitaxial silicon 15.
REFERENCES:
patent: 3290127 (1966-12-01), Kahng et al.
patent: 3623925 (1969-01-01), Jenkins et al.
patent: 3729406 (1973-04-01), Osborne et al.
patent: 3737742 (1973-06-01), Breuer et al.
patent: 3742317 (1973-06-01), Shao
patent: 3770606 (1973-11-01), Lepselter
patent: 3878552 (1975-04-01), Rodgers
patent: 3906540 (1975-09-01), Hollins
patent: 4212256 (1980-07-01), Dalal et al.
patent: 4214256 (1980-07-01), Dalal et al.
patent: 4228371 (1980-10-01), Mazgy
patent: 4361599 (1982-11-01), Wourms
patent: 4446476 (1984-05-01), Isaac et al.
patent: 4458410 (1984-07-01), Sugaki et al.
Physics of Semiconductor Devices-2nd edition-S. M. Sze-Publisher Wiley and Sons, p. 292.
"Refractory Silicides for Integrated Circuits"-Myrarka-Am Vacuum Soc.-J. Vac. Sci. Technol. 17(4), Jul./Aug. 1980, pp. 775-792, Copyright-1981.
"High Performance Transistor"-Berndlmaier et al., vol. 19, No. 6, Nov. 1976-IBM Tech. Bulletin, pp. 2071-2072.
IBM Technical Disclosure Bulletin, vol. 23, No. 4, Sep. 1980, p. 1396, D. Tuman: "Integrated Schottky Barrier Transistor Design".
IBM Technical Bulletin, vol. 22, No. 10, Mar. 1980, L. Berenbaum et al.: "Metal Silicides for Schottky Barrier Diode Applications".
Thin Solid Films, vol. 93, No. 3/4, Jul. 1982, B.-Y. Tsaur et al.: "Effects of Interface Structure on the Electrical Characteristics of PtSi-Si Schottky Barrier Contacts".
Clark S. V.
Colwell Robert C.
Hille Rolf
National Semiconductor Corporation
Norviel Vernon A.
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