Bubbler for substrate processing

Details Bubbler for substrate processing Bubbler for substrate processing

2008-05-13

2008-05-13

Bushey, Scott (Department: 1797)

Gas and liquid contact apparatus

Contact devices

Liquid tank

C261S135000, C261SDIG065, C118S726000

Reexamination Certificate

active

07370848

ABSTRACT:
A vaporization chamber for a substrate processing system includes a main body, a cover member and a transition member. The main body is made of aluminum and defines a first inner surface, which defines, at least in part, a cavity. The cover member is also made of aluminum. The cover member defines a second inner surface, which also defines, at least in part, the cavity. The cover member includes a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extends from a first outer surface through the cover member to the second inner surface. The transition member is made of stainless steel and has a transition outer surface and a transition inner surface. The transition inner surface is aluminum cladded. The cover member including a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to second inner surface. The transition inner surface and the cover outer surface are welded together.

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