Brush scrubbing-high frequency resonating wafer processing...

Details Brush scrubbing-high frequency resonating wafer processing... Brush scrubbing-high frequency resonating wafer processing...

2005-10-04

2005-10-04

Kim, John (Department: 1744)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S088200, C015S102000, C015S021100

Reexamination Certificate

active

06951042

ABSTRACT:
A substrate cleaning apparatus is provided. The apparatus includes a transducer capable of resonating at a high frequency and a brush material attached to a surface of the transducer. The brush material includes at least one passage extending to the surface of the transducer and is configured to be applied to a surface of a substrate. When the transducer resonates at the high frequency, the transducer is capable of imparting acoustic energy to the surface of the substrate at a location of the at least one passage.

REFERENCES:
patent: 5975094 (1999-11-01), Shurtliff
patent: 6167583 (2001-01-01), Miyashita et al.
patent: 6175983 (2001-01-01), Hirose et al.
patent: 6554010 (2003-04-01), Hirose et al.
patent: 2002/0092544 (2002-07-01), Namba

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