Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-11-04
1996-01-09
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041923, 20419216, 20419234, 427523, 427577, C23C 1434
Patent
active
054826020
ABSTRACT:
One broad-beam ion deposition coating method (10) for depositing diamond-like-carbon (DLC) coatings (124) on the dynamic surfaces (120S) of articles (120) subject to adherence difficulties includes the steps of: (12) preliminarily conditioning the dynamic surface (120S) for broad-beam ion deposition; (14)inserting the article (120) in a deposition chamber (102); (16) evacuating the deposition chamber (102) to a predetermined base pressure; (18) ion sputtering conditioning of the dynamic surface (120) by ionizing an inert gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) onto the dynamic surface; (20) depositing an interface layer (122) on the dynamic surface (120S) by ionizing a first gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy, and directing the ion beam (104B) onto a target (118) to dislodge atoms therefrom, the dislodged atoms depositing on the dynamic surface (120S) to form the interface layer (122); and (22) depositing a DLC coating (124) on the interface layer (122) by ionizing a carbon-based gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) for deposition of carbon ions (C+) onto the interface layer (122) to form the DLC coating (124) thereon.
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Cooper Clark V.
Isabelle Charles J.
Nguyen Nam
Radke Terrance J.
United Technologies Corporation
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