Branching self-assembling photoresist with decomposable...

Details Branching self-assembling photoresist with decomposable... Branching self-assembling photoresist with decomposable...

2006-03-02

2009-11-10

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S908000

Reexamination Certificate

active

07615329

ABSTRACT:
By using a branched long chained chain scission polymer as a photoresist for high resolution extreme ultraviolet (EUV), e-beam or 193 nanometer lithography applications, a relatively higher molecular weight polymer with good mechanical properties may be achieved. In addition, by using chain scission technology, line edge roughness and resolution may be improved at the same time.

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