Bottom anti-reflective coating material composition and method f

Details Bottom anti-reflective coating material composition and method f Bottom anti-reflective coating material composition and method f

1997-12-23

2000-12-26

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

526259, 526284, G03F 711

Patent

active

061656844

ABSTRACT:
A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.

REFERENCES:
patent: 3575925 (1971-04-01), Skoultchi
patent: 4614703 (1986-09-01), Guillet
patent: 5401614 (1995-03-01), Dichiara et al.
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5919599 (1999-07-01), Meador et al.

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