Bonded structures for use in semiconductor processing...

Handling: hand and hoist-line implements – Utilizing fluid pressure – By positive fluid stream directed against article

Reexamination Certificate

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C294S001200, C414S941000

Reexamination Certificate

active

06929299

ABSTRACT:
A structure for use in a semiconductor processing environment is provided, including a first plate a second plate bonded to the first plate. A distal end of the second plate extends beyond a distal end of the first plate. The distal end of the first plate is tapered along a length at least one-half of a width of the first plate adjacent the tapered distal end of the first plate.

REFERENCES:
patent: 821847 (1906-05-01), Arnavat
patent: 1211655 (1917-01-01), Adams et al.
patent: 4911743 (1990-03-01), Bagby
patent: 5324155 (1994-06-01), Goodwin et al.
patent: 5746460 (1998-05-01), Marohl et al.
patent: 6116848 (2000-09-01), Thomas et al.
patent: 6183183 (2001-02-01), Goodwin et al.
patent: 6244641 (2001-06-01), Szapucki et al.
patent: 6499777 (2002-12-01), Wang

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