Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-08-19
1984-03-13
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, C23C 1500
Patent
active
044366027
ABSTRACT:
A method of sputter depositing a desired film thickness profile on a substrate is accomplished by depositing material onto a substrate at spaced apart coating stations whereby a substrate at any of said stations is not coated by the sputter coating action at any of the other sputter stations. The substrate is held stationary during complete sputtering at each station. A blocking shield is placed in fixed position between the substrate and the sputter coating source at one or more of the stations. The duration of sputter coating time at one station may be different than at another station.
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patent: 4100055 (1978-07-01), Rainey
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Harra David J.
Hutchinson Martin A.
Turner Frederick T.
Cole Stanley Z.
Demers Arthur P.
Herbert Leon F.
Varian Associates Inc.
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