Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-08-09
1998-12-15
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430394, 430 30, 430 22, 25049222, 2504922, H01L 2130
Patent
active
058494367
ABSTRACT:
A block mask for making a charged particle beam exposure using block exposure includes a plurality of block mask patterns respectively including repeating patterns, where the block mask patterns are arranged in an order dependent on an exposure sequence, at least one first block mask pattern group made up of arbitrary ones of the block mask patterns which are arranged in a predetermined direction, and at least one second block mask pattern group made up of the arbitrary ones of the block mask patterns which are arranged in a direction opposite to the predetermined direction. The second block mask pattern group is arranged adjacent to the first block mask pattern group.
REFERENCES:
patent: 4424450 (1984-01-01), Ward et al.
patent: 4445039 (1984-04-01), Yew
patent: 5288567 (1994-02-01), Sakamoto et al.
patent: 5432314 (1995-07-01), Yamazaki et al.
patent: 5674413 (1997-10-01), Pfieffer et al.
Yamada Akio
Yasuda Hiroshi
Angebranndt Martin
Fujitsu Limited
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