Block architecture option circuit for nonvalatile...

Static information storage and retrieval – Floating gate – Particular connection

Reexamination Certificate

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Reexamination Certificate

active

06567306

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to a semiconductor memory device and, more particularly, to a block architecture option circuit for nonvolatile semiconductor memory devices.
BACKGROUND OF THE INVENTION
In general, semiconductor memory devices for storing data are classified into volatile memory devices such as DRAM (dynamic random access memory) and SRAM (static random access memory), and nonvolatile memory devices such as PROM (programmable read only memory), EPROM (erasable programmable read-only memory), EEPROM (electrically erasable and programmable read-only memory), and FRAM (ferroelectric random access memory device). Volatile memory devices lose stored data at power-off, but nonvolatile memory devices maintain stored data even after power-off. Therefore, high-density nonvolatile memory devices, in particular, flash EEPROM devices have been widely applied to various fields such as computer systems and digital handy terminals. Due to high programming speed and low power consumption, the flash EEPROM device can be used as a BIOS-ROM (basis input/output system-read-only memory) in personal computer systems and large-amount storing media of integration circuit cards for digital cameras and personal computers. Systems having nonvolatile memories are disclosed in U.S. Pat. Nos. 5,461,646 and No. 5,568,641. Further, a personal computer system using a flash memory as a BIOS-ROM is disclosed in U.S. Pat. No. 5,473,775.
A flash memory cell includes a field effect transistor having a control gate, a floating gate, a source, and a drain. The charge on the floating gate is changed to change the threshold voltage of a flash cell, storing data in the flash cell.
From a standpoint of a memory cell structure, flash EEPROM devices are classified into NAND-type devices and NOR-type devices. A memory of a NAND structure requires one contact per one unit (i.e., string) where a plurality of cells are connected in series. In a memory of a NOR structure, each cell is independently coupled to a bit line and a word line, reducing interruptions caused by other cells during the write or read operation of any cell. Having a relatively large cell current, the memory of a NOR structure can be operated with high speed in comparison with the memory of a NAND structure.
The newest high-integrated NOR flash EEPROM devices adopt a cell array architecture, which is divided into a number of unit regions. That is, bulk and cell transistors are divided into a plurality of sectors or blocks and sources of the cell transistors in a block are connected to a corresponding divided bulk in common. This structure enables all cells in a block to be erased at the same time. Generally, the NOR flash EEPROM devices are programmed with a unit of 1 byte (=8 bits) or 1 word (=16 bits).
In a NOR flash memory device, there are normal blocks for storing normal data and boot (or parameter) blocks. Each of the normal blocks has a size of 64 Kbytes (=32 Kwords). The boot blocks have various sizes such as 32 Kbytes (=16 Kwords), 16 Kbytes (=8 Kwords), and 8 Kbytes (=4 Kwords). These boot blocks are disclosed in U.S. Pat. No. 5,701,492. A boot block of a nonvolatile semiconductor memory is used to store a relatively small amount of information, such as BIOS code data or a password of a computer or a digital handy terminal system. At power-up, a CPU (central processing unit) of a system accesses the boot block in the first place. Compared with normal blocks, erasing and programming operations of the boot block are more frequently performed.
Based on the address coding of a CPU, a cell array block architecture of a nonvolatile semiconductor memory device is generally divided into a top boot block architecture and a bottom boot block architecture.
FIG. 1A
shows a top boot block architecture of a memory cell array
100
in accordance with the prior art. In the top boot block architecture, boot blocks B_BLK
0
-B_BLKm are disposed in a higher order address region and normal blocks N_BLK
0
-N_BLKn are disposed in a lower order address region. When a system is powered up, a CPU supplies the highest block address for the first boot block B_BLK
0
to a nonvolatile memory device, and reads boot codes required for initialization of the system from the first boot block B_BLK
0
. Then, the CPU accesses the block addresses according to a predetermined order and reads boot codes stored in the other boot blocks B_BLK
1
-B_BLKm.
FIG. 1B
shows a bottom block architecture of a memory cell array
100
in accordance with a prior art. In the bottom boot block architecture, boot blocks B_BLK
0
—B_BLKm are disposed in a lower order address region and normal blocks are disposed in a higher order address region. When a system is powered up, a CPU supplies the lowest block address for the first boot block B_BLK
0
to a non-volatile memory device, and reads boot codes required for initialization of the system from the first boot block B_BLK
0
. Then, the CPU accesses the block addresses according to a predetermined order and reads boot codes stored in the other boot blocks B_BLK
1
-B_BLKm.
In order to meet requirements for the two kinds of block architecture options, a metal layer option method is utilized in the prior art.
FIG. 2
is a block diagram showing a cell array
100
, a block address buffer circuit
210
, and a block selection circuit
220
of a nonvolatile semiconductor memory device using the metal layer option method in accordance with the prior art. Referring now to
FIG. 2
, the block address buffer circuit
210
comprises a NOR gate circuit
211
, inverter gate circuits
212
,
213
,
217
, and
218
, and metal wirings
215
,
216
a
, and
216
b
. The NOR gate circuit
211
receives an external block address Axi and a chip enable signal to generate an internal block address signal Ai. A block selection circuit
220
responses to the internal block address Ai to select a corresponding block in the memory cell array
100
.
In a conventional metal layer option method, a nonvolatile semiconductor memory device is designed on the basis of one of the top and the bottom boot block architectures. Then, according to requirement of a user, an inverter gate circuit
214
is added to or separated from a block address buffer circuit
210
. If the memory device is designed to have the top boot block architecture, the inverter gate circuit
214
is not required in the block address buffer circuit
210
of FIG.
2
. Therefore, metal wiring
215
between inverter gate circuits
213
and
217
is formed and other metal wirings
216
a
and
216
b
are not formed. If a user requires the memory device to have the bottom boot block architecture, the inverter gate circuit
214
should be added to the block address buffer circuit
210
. In this case, the metal wiring
216
a
between the inverter gate circuits
213
and
214
, and the metal wiring
216
b
between the inverter gate circuits
214
and
217
should be formed while the metal wiring
215
between the inverter gate circuits
213
and
217
should not be formed. Because polarity of an output signal Ai of the block address buffer circuit
210
is inverted in the bottom boot block architecture, the decoding order of a block address will be the reverse of that of the top boot block architecture.
These cell array block options can be supplied to a user utilizing metal masks or reticles, which are different from each other, in the final fabrication stage. A nonvolatile semiconductor memory device such as a conventional NOR flash memory supports a variety of package options. If cell array options meeting the requirements of a user are added thereto, the number of the metal reticles will be twice as many as without the additional requirements. This leads to increase in device production cost.
SUMMARY OF THE INVENTION
It is an object of the invention to provide a nonvolatile memory device which can solve the foregoing problems.
It is another object of the invention to provide a block option circuit which is capable of making a nonvolatile semiconducto

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