Blazed holographic grating, method for producing the same...

Details Blazed holographic grating, method for producing the same... Blazed holographic grating, method for producing the same...

2004-11-19

2008-11-25

Angebranndt, Martin J (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C216S024000

Reexamination Certificate

active

07455957

ABSTRACT:
A substrate is subjected to holographic exposure to a sinusoidal or half-sinusoidal resist pattern corresponding to grating groove thereon. Thereafter, the substrate and the resist pattern are subjected to a first etching step at which they are irradiated with an ion beam obliquely at an angle that is identical to the blaze angle in the presence of CF4as an etching gas, whereby they are cut until the height of the resist is about ⅓ of the initial value. Thereafter, the substrate is subjected to a second etching step at which the substrate is irradiated with an ion beam in the direction corresponding to the bisector of the vertex in the presence of a mixture of CF4and O2as an etching gas, whereby the substrate is cut until the resist disappears completely to an extent such that some overetching occurs.

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