Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-05-20
2008-05-20
Shiao, Rei-tsang (Department: 1626)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S920000, C548S484000, C548S485000, C548S486000
Reexamination Certificate
active
10496014
ABSTRACT:
The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]:(wherein R and A1are as defined in claim1).
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Endo Masayuki
Maesawa Tsuneaki
Sasago Masaru
Urano Fumiyoshi
Kratz Quintos & Hanson, LLP
Shiao Rei-tsang
Wako Pure Chemical Industries Ltd.
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