Bipolar transistor having a buried collector layer

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure

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257505, 257520, 257576, 257587, 257588, H01L 2972, H01L 2702, H01L 2904, H01L 2912

Patent

active

054061130

ABSTRACT:
A bipolar transistor includes a substrate, an insulating layer formed on the substrate, and a semiconductor layer having a bottom surface and side surfaces surrounded by the insulating layer. The semiconductor layer includes a collector region formed in a first surface portion of the semiconductor layer, and a collector lead region having a concentration higher than that of the collector region. The collector read region includes a silicon single crystal layer formed in a second surface portion of the semiconductor layer, and a polysilicon layer having side surfaces surrounded by the silicon single crystal layer. A base region is formed on the collector region, and an emitter region is formed in the base region.

REFERENCES:
patent: 3648128 (1972-03-01), Kobayashi
patent: 4660068 (1987-04-01), Sakuma et al.
patent: 4889823 (1989-12-01), Bertagnolli et al.
Gotou et al., "Soi-Device on Bonded Wafer", Fujitsu Sci. Tech. J., 24,4, pp. 408-417, Dec. 1988.

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