Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-06-06
2010-06-29
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07745068
ABSTRACT:
A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on a topology of the compensation layer and arranged on the transmission-prevention layer and/or the substrate.
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Korean Intellectual Property Office Notice to Submit Response dated Aug. 31, 2006 and English Translation.
Office Action dated Apr. 14, 2010, issued in corresponding Chinese Patent Application No. 200610129040.1.
Han Woo-Sung
Huh Sung-Min
Jung Jin-Sik
Kim Hee-Bom
Harness & Dickey & Pierce P.L.C.
Huff Mark F
Ruggles John
Samsung Electronics Co,. Ltd.
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