Bilayer resist and process for preparing same

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1566591, 156904, 430296, 430313, 430323, G03C 1492, G03C 1494

Patent

active

053188772

ABSTRACT:
A resist pattern on a substrate is formed using an imageable resist layer on the surface of a substrate. The imageable resist layer comprises a silicon-incorporated polystyrene-diene block copolymer having a silicon weight percent of at least about 5 percent. The imageable layer is prepared by reacting a polystyrene-diene block copolymer with a silicon-containing compound in the presence of a platinum catalyst. In a preferred embodiment, the poly(styrene)-diene block copolymers are hydrosilylated by hydrosiloxanes using a platinum-divinyl tetramethyl disiloxane catalyst.

REFERENCES:
patent: 4061799 (1977-12-01), Brewer
patent: 4481049 (1984-11-01), Reichmanis et al.
patent: 4481279 (1984-11-01), Naito et al.
patent: 4504629 (1985-03-01), Lien et al.
patent: 4892617 (1990-01-01), Bates et al.
patent: 5275920 (1994-04-01), Sezi et al.
K. Ito et al., Chem. Abstr. 90:138863y (1978).
Loctite Corp. Japanese Patent 62,179,506, Chem. Abstr. 108:205255g (1987).
L. Khananashvili et al., Chem. Abstr. 104:150506z (1985).
X. Guo et al., Macromolecules 23,5047 (1990).
X. Guo et al., Macromolecules 25,883 (1992).
M. Jurek, Lithographic Evaluation of Phenolic Resin-Siloxane Block Co-Polymers (1989).
M. Bowden et al., Macromol, Symp. 53, 123-137 (1992).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Bilayer resist and process for preparing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bilayer resist and process for preparing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bilayer resist and process for preparing same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-792113

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.