Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Charge transfer device
Patent
1996-07-30
1998-06-30
Niebling, John
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Charge transfer device
438146, H01L 21339
Patent
active
057733244
ABSTRACT:
A bidirectional horizontal charge transfer device and method includes a charge transfer area formed within a substrate, a plurality of first, second, third and fourth poly gates formed over the charge transfer area, an insulating layer formed between the first, second, third and fourth poly gates, a first clock signal applied to the first and second poly gates, a second clock signal applied to the third and fourth poly gates, and a biasing circuit for selectively applying a bias signal to the first and second clock signals so as to selectively change a charge transfer direction.
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patent: 5578511 (1996-11-01), Son
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patent: 5637891 (1997-06-01), Lee
Hwang Il Nam
Yoon Jee Sung
Lebentritt Michael S.
LG Semicon Co. Ltd.
Niebling John
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