BiCMOS semiconductor device having SiGe heterojunction and Si ho

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257197, 257378, 257553, 257555, 257616, H01L 2994, H01L 31072, H01L 310328

Patent

active

055236065

ABSTRACT:
A BiCMOS semiconductor device includes a pair of p-channel and n-channel MOS field effect transistors, a hetero-junction bipolar transistor including an epitaxial base layer made of a first compound semiconductor, and a homo-junction bipolar transistor including a base layer made of a second semiconductor. The hetero-junction bipolar transistor is operated in a low collector current region less than a critical collector current value at which the hetero-junction bipolar transistor has the maximum value of a cutoff frequency thereof. The homo-junction bipolar transistor is operated in a high collector current region more than a critical collector current value at which the homo-junction bipolar transistor has the maximum value of a cutoff frequency thereof.

REFERENCES:
patent: 5268588 (1993-12-01), Marum
patent: 5323031 (1994-06-01), Shoji et al.
patent: 5399894 (1995-03-01), Maeda et al.
Imai, K., et al.; "A Cyro -BiCMOS Technology with Si/SiGe Heterojunction Bipolar Transistors", IEEE 1990 Bipolar Circuits and Technology Meeting 4.4, pp. 90-93.
By E. Prinz et al., "The effect of Base-Emitter Spacers and Strain-Dependent Densities of States in Si/SI.sub.1-x Ge.sub.x /Si Heterojunction Bipolar Transistors", IEEE, 1989, pp. 639-642.
By K. Imai et al., "A Cryo-BiCMOS Technology with Si/SiGe Heterojunction Bipolar Transistors", IEEE 1990 Bipolar Circuits and Technology Meeting, pp. 90-93.

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