Fishing – trapping – and vermin destroying
Patent
1995-06-02
1997-06-03
Bowers, Jr., Charles L.
Fishing, trapping, and vermin destroying
437171, 437173, 437247, 324765, 2504922, H01L 2126
Patent
active
056354100
ABSTRACT:
The time and labor required for bias temperature (BT) treatment of a semi-conductor wafer is reduced by utilizing apparatus in which turning a switch 40 on connects a first d.c. power source 30 to apply a positive high voltage between a first wire 20 and a semiconductor wafer 100 while a second d.c. power source 32 applies a negative high voltage between a second wire 22 and the semiconductor wafer 100. This results in positive corona discharge between the first wire 20 and the semiconductor wafer 100 and negative corona discharge between the second wire 22 and the semiconductor wafer 100. After cessation of corona discharge, the semiconductor wafer 100 is heated to a high temperature for a predetermined time period with a heater 120 embedded in a stage 110 that supports the wafer that is being treated.
REFERENCES:
patent: 4014772 (1977-03-01), Woods et al.
patent: 4168432 (1979-09-01), Williams et al.
patent: 4326165 (1982-04-01), Szedon
patent: 4812756 (1989-03-01), Curtis et al.
patent: 5216362 (1993-06-01), Verkuil
patent: 5233291 (1993-08-01), Kouno et al.
patent: 5498974 (1996-03-01), Verkuil et al.
M.H. Woods et al., J.Appl. Phys., 44(12)(1973)5506, "Injection and removal of ionic charge at room temperature . . . SiO2" Dec. 1973.
P. Edelman et al., SPIE Proc., 2337 (1994) 154, "New approach to measuring oxide charge and mobile ion concentration" Oct. 1994.
Seiichi Iwamatsu, Semiconductor Surface Phenomenon, "Study of Movable Ions (Na+) included in a SiO.sub.2 Film", Section 2, pp. 16-51. (university thesis).
Bowers Jr. Charles L.
Dainippon Screen Manufacturing Co. Ltd.
Radomsky Leon
LandOfFree
Bias temperature treatment method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Bias temperature treatment method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bias temperature treatment method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-391139