Electric heating – Metal heating – By arc
Reexamination Certificate
2007-01-26
2010-12-28
Paschall, Mark H (Department: 3742)
Electric heating
Metal heating
By arc
C219S121430, C219S121440, C118S7230IR, C156S345510, C156S345470
Reexamination Certificate
active
07858898
ABSTRACT:
A device for cleaning a bevel edge of a semiconductor substrate. The device includes a lower electrode assembly that has a top surface and is adapted to support the substrate and an upper electrode assembly that has a bottom surface opposing the top surface. The lower and upper electrode assemblies generate plasma for cleaning the bevel edge of the substrate disposed between the top and bottom surfaces during operation. The device also includes a mechanism for suspending the upper electrode assembly over the lower support and adjusting the tilt angle and horizontal translation of the bottom surface relative to the top surface.
REFERENCES:
patent: 4875989 (1989-10-01), Davis et al.
patent: 4899195 (1990-02-01), Gotoh
patent: 5213650 (1993-05-01), Wang et al.
patent: 5425846 (1995-06-01), Koze et al.
patent: 5945351 (1999-08-01), Mathuni
patent: 6004631 (1999-12-01), Mori
patent: 6241825 (2001-06-01), Wytman
patent: 6406589 (2002-06-01), Yanagisawa
patent: 6436303 (2002-08-01), Kim et al.
patent: 6837963 (2005-01-01), Tanaka et al.
patent: 6837967 (2005-01-01), Berman et al.
patent: 7695590 (2010-04-01), Hanawa et al.
patent: 2003/0029570 (2003-02-01), Kawamura et al.
patent: 2004/0137745 (2004-07-01), Houghton et al.
patent: 2004/0238488 (2004-12-01), Choi et al.
patent: 2005/0173067 (2005-08-01), Lim
patent: 2005/0178505 (2005-08-01), Kim
patent: 02-192717 (1990-07-01), None
patent: 05-082478 (1993-04-01), None
patent: 07-142449 (1995-06-01), None
patent: 10-2003-0002241 (2003-01-01), None
patent: 10-2006-0016280 (2006-02-01), None
patent: 10-2006-0037819 (2006-05-01), None
International Search Report and Written Opinion dated Apr. 29, 2008 for PCT/US2008/000940.
Bailey III Andrew D.
Kennedy William S.
Kim Yun-sang
Kuthi Andras
Schoepp Alan M.
Buchanan & Ingersoll & Rooney PC
Lam Research Corporation
Paschall Mark H
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