Bernoulli blade

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...

Reexamination Certificate

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Details

C134S061000, C134S151000, C294S092000

Reexamination Certificate

active

07926494

ABSTRACT:
An end effector for a transport robot arm for a wafer wet cleaning system has an arm with a chuck at an end of the arm to support a wafer. The chuck also includes a cavity to spray a bottom surface of the wafer with a cleaning fluid. At least two branches extend from the chuck away from the arm with a roller at the end of each branch to hold the wafer. A spray bar is coupled to the arm. The spray bar is configured to hold and spray a top surface of the wafer with the cleaning fluid.

REFERENCES:
patent: 6083320 (2000-07-01), Lee
patent: 6913302 (2005-07-01), Yokota et al.
patent: 2003/0077162 (2003-04-01), Whitcomb
patent: 2004/0012363 (2004-01-01), Simondet
patent: 2005/0110291 (2005-05-01), Klein et al.

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