Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-04-21
1994-09-06
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430326, 430921, 430286, 430287, 430281, G03C 1492, G03C 1494, G03C 176
Patent
active
053447425
ABSTRACT:
The present invention comprises certain benzyl-substituted photoactive compounds and photoresist compositions comprising such photoactive compounds. The benzyl-substituted photoactive compounds of the invention are particularly suitable as the photoactive component in chemically amplified positive-acting and negative-acting compositions.
REFERENCES:
patent: 5118582 (1992-06-01), Ueno et al.
patent: 5204217 (1993-04-01), Aoai et al.
Barclay George
Rajaratnam Martha M.
Sinta Roger F.
Codd Bernard
Corless Peter F.
Goldberg Robert L.
McCamish Marion E.
Shipley Company Inc.
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