Benzene diazonium salts and diazotype material utilizing same

Details Benzene diazonium salts and diazotype material utilizing same Benzene diazonium salts and diazotype material utilizing same

1979-08-22

1981-05-12

Bowers, Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430149, 430186, 260141, G03C 154, C07C11304

Patent

active

042672490

ABSTRACT:
Benzene diazonium compounds of the general formula ##STR1## wherein R.sub.1 is alkylamino, dialkylamino, cycloalkylamino, dicycloalkylamino, cycloalkylalkylamino, aralkylamino, diaralkylamino, alkylaralkylamino, cycloalkylaralkylamino, arylamino, diarylamino, alkylarylamino, cycloalkylarylamino, acoylamino, acoylalkylamino, acoylcycloalkylamino, acoylaralkylamino, acoylarylamino, aroylamino, aroylalkylamino, aroylcycloalkylamino, aroylaralkylamino, aroylarylamino, morpholino, piperidino, triazinyl, alkylthio, hydroxyalkylthio, cycloalkylthio, aralkylthio, or arylthio; R.sub.2 is alkyl, aralkyl, aryl, or alkoxyalkyl; R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 may be the same or different and are hydrogen, alkyl, cycloalkyl, aralkyl, aryl, or halogen, at least one of the substituents R.sub.3 to R.sub.8 not being hydrogen; and X is an anion. Salts of the foregoing compounds are utilized in diazotype materials having improved water resistance and speed of development without impairment of other characteristics such as light sensitivity.

REFERENCES:
patent: 3281245 (1966-10-01), Werner et al.
patent: 3311475 (1967-03-01), Van Loon et al.
patent: 3338713 (1967-08-01), Hendrickx et al.
patent: 3397058 (1968-08-01), Van Loon et al.
patent: 3397985 (1968-08-01), Hendrickx
patent: 3407066 (1968-10-01), Mustacchi et al.
patent: 3520692 (1970-07-01), Knoester et al.
patent: 3547637 (1970-12-01), Scheler et al.
patent: 3868255 (1975-02-01), Garnish et al.

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