Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2007-04-17
2007-04-17
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
Reexamination Certificate
active
10956817
ABSTRACT:
An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.
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5 pg PCT Int'l Search Report (Form PCT/ISA/210) fm corresponding PCT Int'l Appl. No. PCT/US2005/036567, Int'l Filing Date: Sep. 28, 2005; Priority Date: Oct. 1, 2004.
Barusso Scott T.
Perel Alexander S.
Stone Dale K.
Stone Lyudmila
Axcelis Technologies Inc.
Berman Jack I.
Tarolli, Sundheim, Covell & Tummino, L.P.A.
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