Beam source

Details Beam source Beam source

2005-09-27

2005-09-27

Lee, John R. (Department: 2881)

Radiant energy

Electrically neutral molecular or atomic beam devices and...

Reexamination Certificate

active

06949735

ABSTRACT:
An object of the present invention is to provide a beam source capable of efficiently generating a high-density energy beam having good directivity and a relatively large beam diameter. The beam source of the present invention comprises a discharge tube; a gas inlet for introducing gas into the discharge tube; three electrodes mounted in the discharge tube downstream from the gas inlet, wherein the electrode on the upstream end has a plurality of openings through which the gas can pass, the middle electrode is a mesh-shaped electrode, and the electrode on the downstream end is a beam-emitting electrode having a plurality of beam-emitting holes and is disposed in a plane parallel to the middle electrode; plasma-generating means disposed between the two upstream electrodes on the outside of the discharge tube for transforming gas introduced into the discharge tube into plasma; and voltage-applying means for accelerating the beam between the two downstream electrodes and emitting the accelerated beam from the downstream beam-emitting electrode.

REFERENCES:
patent: 4021276 (1977-05-01), Cho et al.
patent: 4870284 (1989-09-01), Hashimoto et al.
patent: 5216330 (1993-06-01), Ahonen
patent: 5518572 (1996-05-01), Kinoshita et al.
patent: 5883470 (1999-03-01), Hatakeyama et al.
patent: 5969366 (1999-10-01), England et al.
patent: 5983828 (1999-11-01), Savas
patent: 6331701 (2001-12-01), Chen et al.
patent: 2002/0011560 (2002-01-01), Sheehan et al.
patent: 848 434 (1998-06-01), None
patent: 6-36695 (1994-02-01), None
patent: 6-124682 (1994-05-01), None
patent: 8-45457 (1996-02-01), None
patent: 10-229213 (1998-08-01), None
patent: 2000-164580 (2000-06-01), None

Affiliated with

Also associated with

Rating

Beam source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Beam source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Beam source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3436301