Beam homogenizer laser irradiation, apparatus, semiconductor...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S487000, C257SE21134

Reexamination Certificate

active

07112477

ABSTRACT:
An optical system (in FIGS.1A and1B) wherein a rectilinear laser beam of homogeneous energy distribution is defined for annealing a non-single crystalline semiconductor film (a surface to-be-irradiated1108), is constructed of reflectors (1106, 1107etc.) easily and inexpensively without including lenses of transmission type. The rectilinear laser beam can be defined having a length of at least 600 (mm) which corresponds to the shorter latus of a large-sized substrate for mass production.

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