X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-09-20
2005-09-20
Bruce, David V. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S081000, C378S207000
Reexamination Certificate
active
06947520
ABSTRACT:
A method for testing a surface of a sample includes irradiating the surface at a grazing incidence with a beam of radiation having a focal region, whereby the radiation is reflected from the surface. At least one of the focal region and the sample is adjusted through a plurality of adjustment stages within an adjustment range so as to vary a location of the focal region relative to the surface. Respective angular profiles of the radiation reflected from the surface are measured at the plurality of adjustment stages, and the angular profiles are compared in order to select an adjustment within the range at which the surface is in a desired alignment with the beam.
REFERENCES:
patent: 4725963 (1988-02-01), Taylor et al.
patent: 5151588 (1992-09-01), Kiri et al.
patent: 5574284 (1996-11-01), Farr
patent: 5619548 (1997-04-01), Koppel
patent: 5740226 (1998-04-01), Komiya et al.
patent: 5923720 (1999-07-01), Barton et al.
patent: 5949847 (1999-09-01), Terada et al.
patent: 6192103 (2001-02-01), Wormington et al.
patent: 6381303 (2002-04-01), Vu et al.
patent: 6389102 (2002-05-01), Mazor et al.
patent: 6453006 (2002-09-01), Koppel et al.
patent: 6507634 (2003-01-01), Koppel et al.
patent: 6512814 (2003-01-01), Yokhin et al.
patent: 6643354 (2003-11-01), Koppel et al.
patent: 6711232 (2004-03-01), Janik
patent: 6744850 (2004-06-01), Fanton et al.
patent: 6744950 (2004-06-01), Alcksoff
patent: 6771735 (2004-08-01), Janik et al.
patent: 2001/0028699 (2001-10-01), Iwasaki
patent: 2001/0043668 (2001-11-01), Hayashi et al.
patent: 2002/0097837 (2002-07-01), Fanton et al.
patent: 2002/0110218 (2002-08-01), Koppel et al.
patent: 2003/0157559 (2003-08-01), Omote et al.
patent: 2004/0052330 (2004-03-01), Koppel et al.
U.S. Appl. No. 10/078,640, filed Feb. 19, 2002, “Dual-Wavelength X-Ray Reflectometry”, Assignee, Jordan Valley Applied Radiation Ltd.
Wiener, G, et al., “Characterization of titanium nitride layers by grazing-emission X-ray fluorescence spectrometry”, Applied Surface Science, 125, 1998, pp 129-136.
Holy, V., et al., “High-Resolution X-Ray Scattering from Thin Films and Multilayers”, Springer Verlag, 1999, pp 18-21.
A. Naudon et al., “New Apparatus for Grazing X-Ray Reflectometry in the Angle-Resolved Dispersive Mode”, Journal of Applied Crystallography 22 (1989), p. 460-464
OXFORD Oxford Instruments Inc. X-Ray Technology Group, Scotts Valley, California, Series 5000/75 Packaged X-Ray tubes, Model XTF5011, Jun. 1999 (2 pages).
X-Ray Doubly-Bent Focusing Crystal Optic Test Report, Produced by X-Ray Optical Systems Inc.,, of Albany, New York, Nov. 2000 (1 page).
Data Sheet; Multichannel Detector Head with BT-CCD for Device No. S7032-0908N, Produced by Hamamatsu, of Hamamatsu City, Japan May 2000 (3 pages).
J. Spear, “Speeding low-k integration-Metrology for Low-k Materials”, Silknet Aliance, 2003 (18 pages).
J.R. Levine Parrill, et al. “GISAXS-Glancing Incidence Small Angle X-ray Scattering”, Journal de Physique IV 3 (Dec. 1993), pp. 411-417.
Jaklevic, et al., “High Rate X-Ray Fluorescence Analysis by Pulsed Excitation”, IEEE Transactions on Nuclear Science NS-19:3 (1972), pp. 392-395.
Jaklevic, et al., “Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers”, Advances in X-Ray Analysis 15 (1972), pp. 266-275.
Jaklevic, et al., “Energy Dispersive X-Ray Fluorescence Spectrometry using Pulsed X-Ray Excitation”, Advances in X-Ray Analysis 19 (1976), pp. 253-265.
Wormington, Characterization of Pore Size Distribution in Low k Dielectrics Using X-ray Reflectivity, presented at the Sematech Gate Stack Engineering Workshop (Austin, Texas, May 2, 2002) (17 pages).
Y. Ito et al, “X-ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films”, Presented at the International Sematech Ultra-Low-k Workshop (San Francisco, CA, Jun. 6-7, 2002) (22 pages).
N. Wu, et al., “:Substepping and its Application to HST Imaging”, Astronomical Data analysis Software and Systems VII, ASP Conference Series, vol. 145, 1998; Jul. 28,-2003 (4 pages).
Berman David
Mazor Isaac
Yokhin Boris
Bruce David V.
Christie Parker and Hale, LLP
Jordan Valley Applied Radiation Ltd.
Thomas Courtney
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