Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-03-20
2011-10-04
Gramaglia, Maureen (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345430
Reexamination Certificate
active
08028652
ABSTRACT:
A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.
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English Machine Translation of JP 09-055372 A to Inoue. Obtained from http://www19.ipdl.ncipi.go.jp/PA1/cgi-bin/PA1INDEX on Sep. 14, 2006.
Official English Translation of JP 09-055372 to Inoue. Obtained Jan. 2009.
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Inokuchi Yasuhiro
Ishimaru Nobuo
Kontani Tadashi
Takebayashi Motonari
Toyoda Kazuyuki
DLA Piper (LLP) US
Gramaglia Maureen
Hitachi Kokusai Electric Inc.
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