Batch-type remote plasma processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Reexamination Certificate

active

07861668

ABSTRACT:
A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.

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English Machine Translation of JP 05-251391 to Shimada. Obtained on Sep. 13, 2008 from http://www19.ipdl.inpit.go.jp/PA1/cgi-bin/PA1DETAIL.
Official English translation of JP 09-055372 to Inoue. Obtained Jan. 2009.
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Japanese language office action and its English translation for corresponding Japanese application No. 2002-003615 dated Jan. 23, 2007.
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