Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2011-01-04
2011-01-04
Gramaglia, Maureen (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
Reexamination Certificate
active
07861668
ABSTRACT:
A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.
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Inokuchi Yasuhiro
Ishimaru Nobuo
Kontani Tadashi
Takebayashi Motonari
Toyoda Kazuyuki
DLA Piper (LLP) US
Gramaglia Maureen
Hitachi Kokusai Electric Inc.
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