Basic compound, resist composition and patterning process

Details Basic compound, resist composition and patterning process Basic compound, resist composition and patterning process

2006-11-28

2006-11-28

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S170000, C430S905000, C430S920000

Reexamination Certificate

active

07141351

ABSTRACT:
Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.

REFERENCES:
patent: 5442087 (1995-08-01), Eichhorn et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5529886 (1996-06-01), Eichhorn et al.
patent: 5612169 (1997-03-01), Eichhorn et al.
patent: 5658706 (1997-08-01), Niki et al.
patent: 5691100 (1997-11-01), Kudo et al.
patent: 5744281 (1998-04-01), Niki et al.
patent: 5843319 (1998-12-01), Przybilla et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6703181 (2004-03-01), Hayashi et al.
patent: 2005/0095527 (2005-05-01), Yokoyama et al.
patent: 63-27829 (1988-02-01), None
patent: 2-27660 (1990-06-01), None
patent: 5-158239 (1993-06-01), None
patent: 5-232706 (1993-09-01), None
patent: 5-249662 (1993-09-01), None
patent: 5-249683 (1993-09-01), None
patent: 2-257282 (1993-10-01), None
patent: 5-289322 (1993-11-01), None
patent: 5-289340 (1993-11-01), None
patent: 6-194834 (1994-07-01), None
patent: 6-242605 (1994-09-01), None
patent: 6-242606 (1994-09-01), None
patent: 6-263716 (1994-09-01), None
patent: 6-263717 (1994-09-01), None
patent: 6-266100 (1994-09-01), None
patent: 6-266111 (1994-09-01), None
patent: 7-92678 (1995-04-01), None
patent: 7-92680 (1995-04-01), None
patent: 7-92681 (1995-04-01), None
patent: 7-120929 (1995-05-01), None
patent: 7-128859 (1995-05-01), None
patent: 7-134419 (1995-05-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 2000-314956 (2000-11-01), None
Hinsberg et al., “Fundamental studies of airborne chemical contamination of chemically amplified resists”, Journal of Photopolymer Science and Technology, vol. 6, No. 4, 1993, 535-546.
Kumada et al., “Study on over-top coating of positive chemical amplification resists for KrF excimer laser lithography”, Journal of Photopolymer Science and Technology, vol. 6, No. 4, 1993, 571-574.
Hatakeyama et al., “Investigation of discrimination enhancement with new modeling for poly-hydroxystyrene positive resists”, Journal of Photopolymer Science and Technology, vol. 13, No. 4, 2000, 519-524.

Affiliated with

Also associated with

Rating

Basic compound, resist composition and patterning process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Basic compound, resist composition and patterning process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Basic compound, resist composition and patterning process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3692012