Basic compound, resist composition and patterning process

Details Basic compound, resist composition and patterning process Basic compound, resist composition and patterning process

2006-11-28

2006-11-28

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S330000, C430S905000, C430S910000

Reexamination Certificate

active

07141352

ABSTRACT:
Resist compositions comprising basic compounds having a benzimidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.

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