Baseband V-I probe

Details Baseband V-I probe Baseband V-I probe

1996-07-22

1998-06-23

Lee, Benny

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 315224, 330294, 21912121, 21912136, H01J 724

Patent

active

057709220

ABSTRACT:
An RF probe for a plasma chamber picks up current and voltage samples of the RF power applied to an RF plasma chamber, and the RF voltage and current waveforms are supplied to respective mixers. A local oscillator supplies both mixers with a local oscillator signal at the RF frequency plus or minus about 15 KHz, so that the mixers provide respective voltage and current baseband signals that are frequency shifted down to the audio range. The phase relation of the applied current and voltage is preserved in the baseband signals. These baseband signals are then applied to a stereo, two-channel A/D converter, which provides a serial digital signal to a digital signal processor or DSP. A local oscillator interface brings a feedback signal from the DSP to the local oscillator. The DSP can be suitably programmed to obtain complex Fast Fourier Transforms of the voltage and current baseband samples. The frequency-domain spectra are analyzed to obtain, with great accuracy, magnitude of voltage and current and phase angle. Other parameters are derived from these three.

REFERENCES:
patent: 4629940 (1986-12-01), Gagne et al.
patent: 5556549 (1996-09-01), Patrick et al.
patent: 5565737 (1996-10-01), Keane
patent: 5712592 (1998-01-01), Stimson et al.

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