Base soluble polymers for photoresist compositions

Details Base soluble polymers for photoresist compositions Base soluble polymers for photoresist compositions

2006-03-10

2009-06-23

Schilling, Richard (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S326000, C430S327000, C430S905000, C430S909000, C430S910000

Reexamination Certificate

active

07550249

ABSTRACT:
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.

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