Base-soluble polyimide release layers for use in microlithograph

Details Base-soluble polyimide release layers for use in microlithograph Base-soluble polyimide release layers for use in microlithograph

1989-03-30

1994-01-25

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528125, 528128, 528174, 528176, 528183, 528184, 528185, 528188, 528219, 528220, 528229, 528272, 528293, 528352, C08G 6926, C08G 802, C08G 7310

Patent

active

052816907

ABSTRACT:
Base-soluble release layer compositions for microlithographic processing, comprising nonamic acid functionalized polyamic acid/imide resins are disclosed. These materials permit concurrent lithographic development of photoresist and release layers. They also afford effective lift-off, by alkaline media, even after high imidization.

REFERENCES:
patent: 4378400 (1983-03-01), Makino et al.
patent: 4903461 (1978-06-01), Lomest et al.
patent: 5024922 (1991-06-01), Moss et al.

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