Base plater or vacuum deposition apparatus with individually and

Coating processes – Coating by vapor – gas – or smoke – Moving the base

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Details

4272481, 118715, 118721, 118722, 118730, C23C 1400

Patent

active

060904445

ABSTRACT:
A base plater or a vacuum deposition apparatus 24 having individually and selectively controlled work holders 10 and a capactively coupled crystal monitor 26. A flipping control mechanism 31 individually and selectively controls flipping of each of the work holders 10 by selectively engaging a flip lever 32 to a flip gear 14 of each work holder 10. The flipping control mechanism 31 allows individual and selective rotation of the work holders 10 to plating and non-plating positions for particular plating processes or runs. Rings 28, 36, 40, and 42 are used to provide a generally open central area 60 that is generally free from obstructions that may adversely affect the plating process and/or the surface or components of the base plater apparatus 24. A crystal monitor 26 is mounted to rotational ring 28 which is in the same rotational plane and periphery of the work holders 10. The crystal monitor 26 is capacitvely coupled to a control circuit 58 via capacitor rings 40 and 42 wherein a capacitive gap 68 exists therebetween.

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