Base developable negative acting photoresists

Details Base developable negative acting photoresists Base developable negative acting photoresists

1989-09-11

1992-04-21

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430288, 430906, 522142, G03F 7037

Patent

active

051067200

ABSTRACT:
A base developable negative acting photoresist composition which is thermally stable, provides high resolution at short exposure times and is capable of development by means of conventional aqueous alkaline developers. The present compositions comprise an alkali soluble hydroxylated polyamide and/or polyimide binder material, a photopolymerizable compound containing at least two ethylenically-unsaturated double bonds, and a light-sensitive photoinitiator.

REFERENCES:
patent: 4572887 (1986-02-01), Geissler

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