Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-01-23
2007-01-23
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
C156S345290
Reexamination Certificate
active
09828550
ABSTRACT:
A chemical vapor deposition apparatus comprises a reaction chamber and one or more vitreous components having an outer surface that is covered at least in part by a devitrification barrier layer. In some arrangements, the one or more vitrious components can include a thermocouple. In a preferred arrangement, the devitrification barrier coating is formed from silicon nitride, which can be deposited on the vitreous component using chemical vapor deposition (CVD).
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Pending Application: U.S. Appl. No. 09/184,490, filed Nov. 2, 1998, entitled Long Life High Temperature Process Chamber, in the name of Wengert et al. and assigned to ASM America, Inc.
ASM America Inc.
Knobbe Martens & Olson Bear LLP.
Zervigon Rudy
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