Barrel type of epitaxial vapor phase growing apparatus

Details Barrel type of epitaxial vapor phase growing apparatus Barrel type of epitaxial vapor phase growing apparatus

1985-03-12

1986-12-30

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118733, C23C 1308

Patent

active

046320601

ABSTRACT:
A barrel-type epitaxial vapor phase growing apparatus in which a susceptor for mounting wafers to be treated on a plurality of plates is rotatably hung by a rod inside a bell jar. Purge gases are supplied to the casing housing the drive mechanism and a baffle directs the gases along the rod and into the susceptor. The purge gases carry dust which is thus kept away from the wafers on the outside of the susceptor as it passes through the susceptor to an exhaust at the lower end of the reaction chamber. The flowing purge gases also cool the susceptor more quickly after treatment.

REFERENCES:
patent: 4446817 (1984-05-01), Crawley

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